The Dry Film Photoresist Market is forecast to grow from USD 4.01 billion in 2018 to USD 5.14 billion by 2026, at a CAGR of 3.1 %, during the forecast period. Advancements in technology which is increasing the utilization of Nano devices is the major driving factor of the market. The Dry Film Photoresist Market is forecast to show significant growth due to the increase in implementation photo-resist technology and growing demand of the technology in the IC’s and semiconductor markets. The rising need for Nano devices is helping the market.
A photoresist is a light-sensitive material used in the process of photoengraving or photolithography which is applied to a surface to produce the desired pattern to be imaged. It is used in semiconductors ICs, printed circuit boards, LCDs and others application. The applications of the photoresist technology is driving the market worldwide.
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The research study comprises of vital information focusing on major market trends and estimated revenue growth rate. Additionally, the report highlights the market competition including the portfolios and strategic alliances and endeavors of the key competitors. It focuses on the mergers and acquisitions, joint ventures, partnerships, collaborations, product launches, brand promotions, and agreements, among others. The report also offers key insights about top companies in the market along with their company overview, business expansion plans, financial standing, production and manufacturing capacity, and global position.
Key companies operating in the market include: Some of the major key players in the photoresist market are Asahi Kasei (Japan), TOKYO OHKA KOGYO CO., LTD. (Japan), JSR Corporation (Japan), The Dow Chemical Company (U.S.), Fujifilm Electronics Material Co., Ltd. (Japan), Shin-Etsu Chemical Co., Ltd. (Japan), Sumitomo Chemicals Co., LTD. (Japan), HITACHI Chemical (Japan) , GREAT EASTERN RESINS INDUSTRIAL CO., LTD. (Taiwan) and AZ Electronic Materials (Luxembourg)
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The report provides comprehensive details about the market with respect to overall revenue, sales and consumption, pricing trends, gross margins, growth rate, and market size. The report also provides an extensive analysis of key regions where the market has established its presence. The report covers major geographical regions such as North America, Europe, Asia Pacific, Latin America, and Middle East and Africa. A country-wise analysis is also included to offer better insights into regional spread of the Dry Film Photoresist market.
Category Outlook (Revenue, USD Million; 2018-2026)
- ArF immersion
- ArF dry
Type Outlook (Revenue, USD Million; 2018-2026)
- Anti-reflective coating
Implementation Outlook (Revenue, USD Million; 2018-2026)
- Semiconductor Ic’s
- Printed circuit board
Further key findings from the report suggest
- The Dry Film Photoresist Market is forecast to grow from USD 4.01 billion in 2018 to USD 5.14 billion by 2026, at a CAGR of 3.1 %, during the forecast period. Advancements in technology which is increasing the utilization of Nano devices is the major driving factor of the market.
- Based on Category, the market is divided as ArF immersion, I-line, G-line, ArF, KrF. The ArF immersion sector of the photoresist market is estimated to grow at the highest CAGR of 3% during the forecast period. ArF immersion has superior properties like low defects, high resolution and narrow wavelength. It also prevents the requirement for other techniques like strong resolution enhancement.
- Based on Types, the market is segmented as remover, anti-reflective coatings and developer. Anti-reflection (AR) coating is a kind of optical coating used in the surface of optical elements to reduce reflection. since less light is lost due to reflection, this improves the efficiency
- The Implementation types are Semiconductor and IC’s, Printed circuit boards and LCD’s. The ICs application semiconductors sector is estimated for the largest share of 33% of the global photoresist market. This sector is estimated to continue to dominate during the forecast period.
- The Dry Film Photoresist Market is segmented across five regions, namely, North America, Asia-Pacific (APAC), Europe, the Middle East and Africa (MEA), and Latin America. APAC is forecasted to dominate the market with a highest share of 34 % in 2018.
Table Of Contents-
Chapter 1. Market Synopsis
1.1. Market Definition
1.2. Research Scope Premise
1.4. Market Estimation Technique
Chapter 2. Executive Summary
2.1. Summary Snapshot, 2016 – 2026
Chapter 3. Macro Indicators
3.1. Global need for the use of Nano devices
3.2. Contribution of different industries by the advancement in image processing technology
3.3. Economic growth of of IC’s and semiconductor markets to increase the demand of photoresist
Chapter 4. Dry Film Photoresist Market Segmentation Impact Analysis
4.1. Dry Film Photoresist Market Segmentation Analysis
4.2. Industrial Outlook
4.3. Regulatory Framework
4.4. Dry Film Photoresist Market Impact Analysis
4.4.1. Market driver analysis
126.96.36.199. Enhanced advancements in technology increasing the utilization of Nano devices
188.8.131.52. Growth of IC’s and semiconductor markets to increase the demand of photoresist
184.108.40.206. High demand of image transfer process
4.4.2. Market restraint analysis
220.127.116.11. Insufficient use of the photoresist technology
4.4.3. Key opportunities prioritized
18.104.22.168. Emergence of new technologies such as photoresist technology
22.214.171.124. Implementation of photoresist technologies in several regions
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